Invention Grant
- Patent Title: Process of producing liquid discharge head base material
- Patent Title (中): 生产液体排出头基材的工艺
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Application No.: US12871233Application Date: 2010-08-30
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Publication No.: US08445298B2Publication Date: 2013-05-21
- Inventor: Souta Takeuchi , Masaya Uyama , Hirokazu Komuro
- Applicant: Souta Takeuchi , Masaya Uyama , Hirokazu Komuro
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon U.S.A., Inc. IP Division
- Priority: JP2009-204640 20090904
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/50 ; H01L21/48 ; H01L21/44
Abstract:
A process includes preparing a base material having a first surface provided with an element generating energy that is used for discharging a liquid and an electrode layer that is connected to the element; forming a hollow on a second surface, which is the surface on the opposite side of the first surface, of the base material, wherein part of the electrode layer serves as the bottom face of the hollow; covering the surface of the base material and the bottom face forming the inner face of the hollow with an insulating film; and partially exposing the electrode layer by removing part of the insulating film covering the bottom face using laser light.
Public/Granted literature
- US08415178B2 Process of producing liquid discharge head base material Public/Granted day:2013-04-09
Information query
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