Invention Grant
US08445734B2 Photolabile protective groups for improved processes to prepare oligonucleotide arrays
有权
用于制备寡核苷酸阵列的改进方法的光不稳定保护基
- Patent Title: Photolabile protective groups for improved processes to prepare oligonucleotide arrays
- Patent Title (中): 用于制备寡核苷酸阵列的改进方法的光不稳定保护基
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Application No.: US12792122Application Date: 2010-06-02
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Publication No.: US08445734B2Publication Date: 2013-05-21
- Inventor: Sigrid Buehler , Markus Ott , Wolfgang Pfleiderer
- Applicant: Sigrid Buehler , Markus Ott , Wolfgang Pfleiderer
- Applicant Address: DE Waldkraiburg
- Assignee: NIGU Chemie GmbH
- Current Assignee: NIGU Chemie GmbH
- Current Assignee Address: DE Waldkraiburg
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: C07C205/19
- IPC: C07C205/19 ; C07H21/02 ; C07H21/04

Abstract:
The present invention discloses novel and improved nucleosidic and nucleotidic compounds that are useful in the light-directed synthesis of oligonucleotides, as well as, methods and reagents for their preparation. These compounds are characterized by novel photolabile protective groups that are attached to either the 5′- or the 3′-hydroxyl group of a nucleoside moiety. The photolabile protective group is comprised of a 2-(2-nitrophenyl)-ethyoxycarbonyl skeleton with at least one substituent on the aromatic ring that is either an aryl, an aroyl, a heteroaryl or an alkoxycarbonyl group. The present invention includes the use of the aforementioned compounds in light-directed oligonucleotide synthesis, the respective assembly of nucleic acid microarrays and their application.
Public/Granted literature
- US20100292458A1 NOVEL PHOTOLABILE PROTECTIVE GROUPS FOR IMPROVED PROCESSES TO PREPARE OLIGONUCLEOTIDE ARRAYS Public/Granted day:2010-11-18
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