Invention Grant
US08445873B2 System and method for detecting at least one contamination species in a lithographic apparatus
失效
用于检测光刻设备中的至少一种污染物质的系统和方法
- Patent Title: System and method for detecting at least one contamination species in a lithographic apparatus
- Patent Title (中): 用于检测光刻设备中的至少一种污染物质的系统和方法
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Application No.: US13478446Application Date: 2012-05-23
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Publication No.: US08445873B2Publication Date: 2013-05-21
- Inventor: Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Ralph Kurt , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Peter Cornelis Zalm
- Applicant: Vadim Yevgenyevich Banine , Levinus Pieter Bakker , Ralph Kurt , Johannes Hubertus Josephina Moors , Lucas Henricus Johannes Stevens , Peter Cornelis Zalm
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G21G5/00
- IPC: G21G5/00
Abstract:
A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.
Public/Granted literature
- US20120241610A1 System and Method for Detecting at Least One Contamination Species in a Lithographic Apparatus Public/Granted day:2012-09-27
Information query
IPC分类:
| G | 物理 |
| G21 | 核物理；核工程 |
| G21G | 化学元素的转变；放射源 |
| G21G5/00 | 通过化学反应进行化学元素的推断转变 |
