Invention Grant
- Patent Title: Extreme ultraviolet light source apparatus and target supply device
- Patent Title (中): 极紫外光源设备和目标供应装置
-
Application No.: US13081148Application Date: 2011-04-06
-
Publication No.: US08445877B2Publication Date: 2013-05-21
- Inventor: Hiroshi Someya , Tamotsu Abe , Hideo Hoshino
- Applicant: Hiroshi Someya , Tamotsu Abe , Hideo Hoshino
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: McDermott Will & Emery LLP
- Priority: JP2006-285105 20061019
- Main IPC: A61N5/06
- IPC: A61N5/06 ; G01J3/10 ; H05G2/00

Abstract:
A nozzle protection device capable of protecting a target nozzle from heat of plasma without disturbing formation of a stable flow of a target material in an LPP type EUV light source apparatus. This nozzle protection device includes a cooling unit which is formed with an opening for passing the target material therethrough, and which is formed with a flow path for circulating a cooling medium inside, and an actuator which changes a position or a shape of the cooling unit between a first state of evacuating the cooling unit from a trajectory of the target material and a second state of blocking heat radiation from the plasma to the nozzle by the cooling unit while securing a path of the target material in the cooling unit.
Public/Granted literature
- US20110174996A1 EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS AND NOZZLE PROTECTION DEVICE Public/Granted day:2011-07-21
Information query