Invention Grant
- Patent Title: Phase change memory device having bit-line discharge block and method of fabricating the same
- Patent Title (中): 具有位线放电模块的相变存储器件及其制造方法
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Application No.: US12635920Application Date: 2009-12-11
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Publication No.: US08445880B2Publication Date: 2013-05-21
- Inventor: Hae Chan Park
- Applicant: Hae Chan Park
- Applicant Address: KR Gyeonggi-do
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: Ladas & Parry LLP
- Priority: KR10-2009-0051488 20090610
- Main IPC: H01L29/02
- IPC: H01L29/02 ; H01L47/00 ; H01L21/82

Abstract:
A phase change memory device capable of fully discharging bit lines, even while occupying a relatively small area, and a fabricating method thereof are presented. The phase change memory device includes a semiconductor substrate, a word line area, a discharge line area, a switching PN diode, a dummy PN diode, a phase change structure, and a bit line. The word line area is formed in a memory cell area of the semiconductor substrate. The discharge line area is formed in the bit-line discharge area of the semiconductor substrate. The switching PN diode is formed on the word line area. The dummy PN diode is formed on the discharge line area. The phase change structure is formed on the switching PN diode and is electrically connected to the switching diode. The bit line is electrically connected to the phase change structure and the dummy PN diode.
Public/Granted literature
- US20100314598A1 PHASE CHANGE MEMORY DEVICE HAVING BIT-LINE DISCHARGE BLOCK AND METHOD OF FABRICATING THE SAME Public/Granted day:2010-12-16
Information query
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