Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
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Application No.: US12911083Application Date: 2010-10-25
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Publication No.: US08445962B2Publication Date: 2013-05-21
- Inventor: Satoshi Murakami , Shunpei Yamazaki , Jun Koyama , Mitsuaki Osamè , Yukio Tanaka , Yoshiharu Hirakata
- Applicant: Satoshi Murakami , Shunpei Yamazaki , Jun Koyama , Mitsuaki Osamè , Yukio Tanaka , Yoshiharu Hirakata
- Applicant Address: JP
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP
- Agency: Husch Blackwell LLP
- Priority: JP11-053424 19990302; JP11-097558 19990405
- Main IPC: H01L29/04
- IPC: H01L29/04

Abstract:
An object of the present invention is to provide a semiconductor device having high operation characteristic and reliability. The measures taken are: A pixel capacitor is formed between an electrode comprising anodic capable material over an organic resin film, an anodic oxide film of the electrode and a pixel electrode above. Since the anodic oxide film is anodically oxidized by applied voltage per unit time at 15V/min, there is no wrap around on the electrode, and film peeling can be prevented.
Public/Granted literature
- US20110095312A1 Semiconductor Device and Method of Manufacturing the Same Public/Granted day:2011-04-28
Information query
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