Invention Grant
US08445966B2 Method and apparatus for protection against process-induced charging
有权
用于防止过程引起的充电的方法和装置
- Patent Title: Method and apparatus for protection against process-induced charging
- Patent Title (中): 用于防止过程引起的充电的方法和装置
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Application No.: US11614053Application Date: 2006-12-20
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Publication No.: US08445966B2Publication Date: 2013-05-21
- Inventor: David M. Rogers , Mimi X. Qian , Kwadwo A. Appiah , Mark Randolph , Michael A. VanBuskirk , Tazrien Kamal , Hiroyuki Kinoshita , Yi He , Wei Zheng
- Applicant: David M. Rogers , Mimi X. Qian , Kwadwo A. Appiah , Mark Randolph , Michael A. VanBuskirk , Tazrien Kamal , Hiroyuki Kinoshita , Yi He , Wei Zheng
- Applicant Address: US CA Sunnyvale
- Assignee: Spansion LLC
- Current Assignee: Spansion LLC
- Current Assignee Address: US CA Sunnyvale
- Main IPC: H01L23/62
- IPC: H01L23/62

Abstract:
A semiconductor device (400) for improved charge dissipation protection includes a substrate (426), a layer of semiconductive or conductive material (406), one or more thin film devices (408) and a charge passage device (414). The thin film devices (408) are connected to the semiconductive or conductive layer (406) and the charge passage device (414) is coupled to the thin film devices (408) and to the substrate (426) and provides a connection from the thin film devices (408) to the substrate (426) to dissipate charge from the semiconductive/conductive layer (406) to the substrate (426).
Public/Granted literature
- US20080151590A1 METHOD AND APPARATUS FOR PROTECTION AGAINST PROCESS-INDUCED CHARGING Public/Granted day:2008-06-26
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