Invention Grant
- Patent Title: Lithographic apparatus comprising a magnet, method for the protection of a magnet in a lithographic apparatus and device manufacturing method
- Patent Title (中): 包括磁体的光刻设备，用于保护光刻设备中的磁体的方法和器件制造方法
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Application No.: US12735823Application Date: 2009-02-19
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Publication No.: US08446560B2Publication Date: 2013-05-21
- Inventor: Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelo Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen
- Applicant: Johannes Hubertus Josephina Moors , Norbertus Benedictus Koster , Erik Roelo Loopstra , Martin Frans Pierre Smeets , Antonius Theodorus Wilhelmus Kempen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- International Application: PCT/NL2009/050074 WO 20090219
- International Announcement: WO2009/104962 WO 20090827
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42
Abstract:
A lithographic apparatus includes a magnet being contained in a protective enclosure, the protective enclosure being arranged to protect the magnet from contact with a H2-containing or H-atom containing gas. The enclosure may further contain a hydrogen getter, such as a magnet-surface modifying gas, or a non-hydrogen containing gas. A non-hydrogen containing gas flow may be provided or a non-hydrogen getter gas flow may be provided through at least part of the protective enclosure.
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