Invention Grant
US08446561B2 Lithographic apparatus and a method of measuring flow rate in a two phase flow
有权
平版印刷设备和测量两相流量的流量的方法
- Patent Title: Lithographic apparatus and a method of measuring flow rate in a two phase flow
- Patent Title (中): 平版印刷设备和测量两相流量的流量的方法
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Application No.: US12820448Application Date: 2010-06-22
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Publication No.: US08446561B2Publication Date: 2013-05-21
- Inventor: Pieter Jacob Kramer , Antonius Johannus Van Der Net , Erik Henricus Egidius Catharina Eummelen , Anthonie Kuijper
- Applicant: Pieter Jacob Kramer , Antonius Johannus Van Der Net , Erik Henricus Egidius Catharina Eummelen , Anthonie Kuijper
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42
Abstract:
A lithographic apparatus is disclosed that includes a conduit for two phase flow therethrough. A flow separator is provided to separate the two phase flow into a gas flow and a liquid flow. A flow meter measures the flow rate of fluid in the gas flow or the liquid flow.
Public/Granted literature
- US20110013159A1 LITHOGRAPHIC APPARATUS AND A METHOD OF MEASURING FLOW RATE IN A TWO PHASE FLOW Public/Granted day:2011-01-20
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