Invention Grant
- Patent Title: Electromagnetic field distribution measurement apparatus
- Patent Title (中): 电磁场分布测量装置
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Application No.: US12665767Application Date: 2008-04-23
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Publication No.: US08447539B2Publication Date: 2013-05-21
- Inventor: Norio Masuda
- Applicant: Norio Masuda
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2007-171953 20070629
- International Application: PCT/JP2008/057829 WO 20080423
- International Announcement: WO2009/004856 WO 20090108
- Main IPC: G01R15/00
- IPC: G01R15/00

Abstract:
An electromagnetic field distribution measurement apparatus (10) according to the present invention includes: an electromagnetic field probe (20) for measuring an electromagnetic field distribution; a scan apparatus (30) for scanning the vicinity of a wiring (120) with the electromagnetic field probe (20); and a data processing apparatus (50) for calculating the offset value (ΔXd) of the coordinate of the electromagnetic field probe (20) from the coordinate of the wiring (120). The data processing apparatus (50) extracts a characteristic point (E1 to E3) of the measured electromagnetic field distribution and calculates the offset value (ΔXd) based on the coordinates of the extracted characteristic point (E1 to E3).
Public/Granted literature
- US20100174497A1 ELECTROMAGNETIC FIELD DISTRIBUTION MEASUREMENT APPARATUS Public/Granted day:2010-07-08
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