Invention Grant
US08449151B2 Light control film, backlight device using the same, and method for manufacturing mold for forming uneven pattern 有权
光控膜,使用其的背光装置以及用于形成不均匀图案的模具的制造方法

  • Patent Title: Light control film, backlight device using the same, and method for manufacturing mold for forming uneven pattern
  • Patent Title (中): 光控膜,使用其的背光装置以及用于形成不均匀图案的模具的制造方法
  • Application No.: US12933877
    Application Date: 2009-03-10
  • Publication No.: US08449151B2
    Publication Date: 2013-05-28
  • Inventor: Hideki Etori
  • Applicant: Hideki Etori
  • Applicant Address: JP Tokyo
  • Assignee: Kimoto Co., Ltd.
  • Current Assignee: Kimoto Co., Ltd.
  • Current Assignee Address: JP Tokyo
  • Agency: Kenealy Vaidya LLP
  • Priority: JP2008-073507 20080321
  • International Application: PCT/JP2009/054523 WO 20090310
  • International Announcement: WO2009/116429 WO 20090924
  • Main IPC: F21V5/00
  • IPC: F21V5/00
Light control film, backlight device using the same, and method for manufacturing mold for forming uneven pattern
Abstract:
The present invention provides a light control film that can prevent generation of a moiré pattern when it is superimposed on another member having a regular structure while securing sufficient front luminance, and a backlight device using the same. The light control film of the present invention has a light control layer provided with an uneven pattern on a surface, and in this uneven pattern, a plurality of convexes having circular bases of approximately the same diameters are arranged so that the bases thereof should not overlap with one another and each should touch one or two or more other bases, and ratio of convexes arranged so that each of circular bases thereof should touch both bases of two convexes of which bases touch each other is controlled to be 50 to 92% among the total convexes arranged. The backlight device of the present invention is a backlight device incorporated with the aforementioned light control film.
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