Invention Grant
- Patent Title: Plasma doping method and apparatus thereof
- Patent Title (中): 等离子体掺杂方法及其装置
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Application No.: US13291186Application Date: 2011-11-08
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Publication No.: US08450819B2Publication Date: 2013-05-28
- Inventor: Tomohiro Okumura , Mitsuo Saitoh , Ichiro Nakayama , Taro Kitaoka
- Applicant: Tomohiro Okumura , Mitsuo Saitoh , Ichiro Nakayama , Taro Kitaoka
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2010-250440 20101109
- Main IPC: H01L27/14
- IPC: H01L27/14 ; H01L21/44
Abstract:
In a plasma torch unit, a conductor rod having a spiral shape is disposed inside a quartz pipe having a surface coated with boron glass, and a brass block is disposed on the periphery thereof. While a gas is being supplied into a cylindrical chamber, a high-frequency power is supplied to the conductor rod and a plasma is generated in the cylindrical chamber, so that a base material is irradiated with the plasma.
Public/Granted literature
- US20120115317A1 PLASMA DOPING METHOD AND APPARATUS THEREOF Public/Granted day:2012-05-10
Information query
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