Invention Grant
- Patent Title: Plasma processing apparatus
- Patent Title (中): 等离子体处理装置
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Application No.: US13145960Application Date: 2010-01-25
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Publication No.: US08450933B2Publication Date: 2013-05-28
- Inventor: Masaru Nonomura , Hiroshi Haji , Kiyoshi Arita
- Applicant: Masaru Nonomura , Hiroshi Haji , Kiyoshi Arita
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: Pearne & Gordon LLP
- Priority: JP2009-013993 20090126
- International Application: PCT/JP2010/000404 WO 20100125
- International Announcement: WO2010/084778 WO 20100729
- Main IPC: H01J7/24
- IPC: H01J7/24

Abstract:
A plasma processing apparatus includes a vacuum chamber, a plasma processing execution portion, a discharge state detecting unit, a window portion, a camera, a first storing portion, a second storing portion and an image data extracting unit. When an abnormal discharge is detected, the image data extracting unit extracts at least moving image data showing a generation state of the abnormal discharge from the first storing portion and stores the extracted moving image data in the second storing portion. When plasma processing is ended without the detection of the abnormal discharge, the image data extracting unit extracts, from the first storing portion, moving image data of a predetermined specific period or still image data of a specific period derived from the moving image data of the first storing portion and stores the extracted moving image data or the extracted still image data in the second storing portion.
Public/Granted literature
- US20110273094A1 PLASMA PROCESSING APPARATUS Public/Granted day:2011-11-10
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