Invention Grant
- Patent Title: Re-flow and buffer system for immersion lithography
- Patent Title (中): 用于浸没光刻的再流和缓冲系统
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Application No.: US12388900Application Date: 2009-02-19
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Publication No.: US08451422B2Publication Date: 2013-05-28
- Inventor: Harry Sewell , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
- Applicant: Harry Sewell , Erik Theodorus Maria Bijlaart , Sjoerd Nicolaas Lambertus Donders , Louis John Markoya , Diane McCafferty , Ralph Joseph Meijers
- Applicant Address: NL Veldhoven NL Veldhoven
- Assignee: ASML Netherlands B.V.,ASML Holding NV
- Current Assignee: ASML Netherlands B.V.,ASML Holding NV
- Current Assignee Address: NL Veldhoven NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
A system is disclosed to isolate an environmental chamber of an immersion lithographic apparatus, to which an immersion fluid comprising liquid, is provided from an external environment. Further, there is disclosed a system for measuring flow rate and/or vapor concentration of a gas using a transducer to send and/or receive an acoustic signal.
Public/Granted literature
- US20090213343A1 RE-FLOW AND BUFFER SYSTEM FOR IMMERSION LITHOGRAPHY Public/Granted day:2009-08-27
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