Invention Grant
US08451424B2 Exposure apparatus, method for producing device, and method for controlling exposure apparatus
有权
曝光装置，制造装置的方法以及曝光装置的控制方法
- Patent Title: Exposure apparatus, method for producing device, and method for controlling exposure apparatus
- Patent Title (中): 曝光装置，制造装置的方法以及曝光装置的控制方法
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Application No.: US11338661Application Date: 2006-01-25
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Publication No.: US08451424B2Publication Date: 2013-05-28
- Inventor: Nobutaka Magome , Naoyuki Kobayashi , Yasuyuki Sakakibara , Hiroaki Takaiwa , Hisatsune Kadota
- Applicant: Nobutaka Magome , Naoyuki Kobayashi , Yasuyuki Sakakibara , Hiroaki Takaiwa , Hisatsune Kadota
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2003-281183 20030728; JP2004-045104 20040220
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52
Abstract:
An exposure apparatus (EX) exposes a substrate (P) by projecting an image of a pattern on the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure device (EX) has a liquid supply mechanism (10) which supplies the liquid (1) between the projection optical system (PL) and the substrate (P). The liquid feeding mechanism (10) stops the supply of the liquid (1) when abnormality is detected. This suppresses influence to devices and members in the periphery of the substrate caused by leakage of the liquid forming a liquid immersion area, thereby realizing satisfactory exposure processing.
Public/Granted literature
- US20060132737A1 Exposure apparatus, method for producing device, and method for controlling exposure apparatus Public/Granted day:2006-06-22
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