Invention Grant
- Patent Title: Dichroic mirror, method for manufacturing a dichroic mirror, lithographic apparatus, semiconductor device and method of manufacturing therefor
- Patent Title (中): 二向色镜,二向色镜的制造方法,光刻设备,半导体器件及其制造方法
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Application No.: US12434426Application Date: 2009-05-01
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Publication No.: US08451429B2Publication Date: 2013-05-28
- Inventor: Tjarko Adriaan Rudolf Van Empel
- Applicant: Tjarko Adriaan Rudolf Van Empel
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/54 ; G02B5/20 ; G03F7/20 ; G02B27/14

Abstract:
A dichroic mirror configured to separate a first type of radiation in a first wavelength range having an upper boundary from a second type of radiation in a second wavelength range having a lower boundary greater than the upper boundary of the first wavelength. The mirror includes a substrate, and a stack having a reflective surface facing away from the substrate and a width that increases stepwise in a direction towards the substrate. The stack is formed by alternating layers of first and second materials on the substrate. The reflective surface has steps with a width greater than the upper boundary of the first wavelength and less than the lower boundary of the second wavelength.
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