Invention Grant
US08452455B2 Control device and control method of plasma processing system, and storage medium storing control program
有权
等离子体处理系统的控制装置和控制方法以及存储控制程序的存储介质
- Patent Title: Control device and control method of plasma processing system, and storage medium storing control program
- Patent Title (中): 等离子体处理系统的控制装置和控制方法以及存储控制程序的存储介质
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Application No.: US12496117Application Date: 2009-07-01
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Publication No.: US08452455B2Publication Date: 2013-05-28
- Inventor: Hiroaki Mochizuki , Masahiro Numakura
- Applicant: Hiroaki Mochizuki , Masahiro Numakura
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2008-174711 20080703
- Main IPC: G05B24/04
- IPC: G05B24/04

Abstract:
In a control device of a plasma processing system, a communication unit is configured to receive processing information related to a carrier of a next processing lot. A determination unit is configured to determine whether the processing information received by the communication unit has pre-treatment information related to one of the plasma processing devices. When it is determined that the processing information has the pre-treatment information by the determination unit, a generation unit is configured to generate an object for declaring execution of the pre-treatment for the carrier of a next processing lot if a desired condition of transferring of the carrier is satisfied. In addition, if the object is generated by the generation unit, a process executing control unit is configured to start the pre-treatment for the target object in the carrier of a next processing lot without any notification that the carrier reaches a destination plasma processing device.
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