Invention Grant
- Patent Title: Liquid droplet interproximal cleaning apparatus with gas stream protection
- Patent Title (中): 具有气流保护的液滴邻接清洗装置
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Application No.: US13126497Application Date: 2009-10-30
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Publication No.: US08454360B2Publication Date: 2013-06-04
- Inventor: Jozef Johannes Maria Janssen , Bart Gottenbos
- Applicant: Jozef Johannes Maria Janssen , Bart Gottenbos
- Applicant Address: NL Eindhoven
- Assignee: Koninkliijke Philips Electronics N.V.
- Current Assignee: Koninkliijke Philips Electronics N.V.
- Current Assignee Address: NL Eindhoven
- International Application: PCT/IB2009/054828 WO 20091030
- International Announcement: WO2010/055433 WO 20100520
- Main IPC: A61C3/02
- IPC: A61C3/02

Abstract:
The interproximal cleaning apparatus includes a gas reservoir (12) containing a compressed gas, such as CO2, in both liquid and gaseous states. A siphon tube (20) extends down into the liquid region of the gas reservoir when the apparatus is in an upright position. The siphon tube connects the reservoir to a metering valve (18) which has a metered volume to accommodate an amount of liquid compressed gas which is sufficient for good liquid droplet cleaning when it decompresses and forms a gaseous stream, without damage to the dental regions of the user. If the apparatus is severely tilted or turned upside down, gaseous CO2 or a combination of gaseous and liquid CO2 will enter the siphon tube and then the metering valve. The size of the metering valve will limit the volume of the gaseous CO2 to a safe amount, both when liquid CO2 or gaseous CO2 are applied to the metering valve.
Public/Granted literature
- US20110217671A1 LIQUID DROPLET INTERPROXIMAL CLEANING APPARATUS WITH GAS STREAM PROTECTION Public/Granted day:2011-09-08
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