Invention Grant
US08454731B2 Configuration of contacting zones in vapor-liquid contacting apparatuses 有权
气 - 液接触装置中接触区的构型

  • Patent Title: Configuration of contacting zones in vapor-liquid contacting apparatuses
  • Patent Title (中): 气 - 液接触装置中接触区的构型
  • Application No.: US13584869
    Application Date: 2012-08-14
  • Publication No.: US08454731B2
    Publication Date: 2013-06-04
  • Inventor: Zhanping Xu
  • Applicant: Zhanping Xu
  • Applicant Address: US IL Des Plaines
  • Assignee: UOP LLC
  • Current Assignee: UOP LLC
  • Current Assignee Address: US IL Des Plaines
  • Agent Mark Goldberg
  • Main IPC: B01D53/14
  • IPC: B01D53/14
Configuration of contacting zones in vapor-liquid contacting apparatuses
Abstract:
Vapor-liquid contacting apparatuses comprising a primary contacting zone and a secondary contacting zone are disclosed. A representative secondary contacting zone is a secondary absorption zone, such as a finishing zone for subsequent contacting of the vapor effluent from the primary contacting zone to further remove impurities and achieve a desired purity of purified gas exiting the secondary absorption zone. The secondary contacting zone is disposed below the primary contacting zone, such that the secondary contacting zone, which must operate efficiently in removing generally trace amounts of remaining impurities, is more protected from movement than the more elevated, primary or initial contacting stages for bulk impurity removal. The apparatuses are therefore especially beneficial in offshore applications where they are subjected to rocking.
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