Invention Grant
- Patent Title: Foreign substance removing apparatus, foreign substance removing method, and storage medium
- Patent Title (中): 异物去除装置，异物去除方法和存储介质
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Application No.: US12635107Application Date: 2009-12-10
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Publication No.: US08454752B2Publication Date: 2013-06-04
- Inventor: Masaki Kondo , Takehiro Shindou
- Applicant: Masaki Kondo , Takehiro Shindou
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Rothwell, Figg, Ernst & Manbeck, P.C.
- Priority: JP2008-318237 20081215
- Main IPC: B08B5/00
- IPC: B08B5/00
Abstract:
A foreign substance removing apparatus includes a mounting table for mounting and rotating a substrate; and a laser beam irradiation unit for removing foreign substances attached to a surface of the substrate by irradiating foreign substance cleaning laser beam onto the substrate mounted and rotated on the mounting table. In the foreign substance removing apparatus, the laser beam irradiation unit irradiates laser beam having an elongate shaped irradiation cross section onto the surface of the substrate.
Public/Granted literature
- US20100147327A1 FOREIGN SUBSTANCE REMOVING APPARATUS, FOREIGN SUBSTANCE REMOVING METHOD, AND STORAGE MEDIUM Public/Granted day:2010-06-17
Information query
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