Invention Grant
- Patent Title: Substrate bonding apparatus and substrate bonding method
- Patent Title (中): 基板接合装置和基板接合方法
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Application No.: US12703714Application Date: 2010-02-10
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Publication No.: US08454771B2Publication Date: 2013-06-04
- Inventor: Takahiro Horikoshi
- Applicant: Takahiro Horikoshi
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2007-209781 20070810; JP2008-172396 20080701
- Main IPC: B32B41/00
- IPC: B32B41/00

Abstract:
A substrate bonding apparatus is equipped with a first table that holds one wafer of two wafers, a stage device that holds the other wafer in an orientation capable of opposing to the one wafer and that is movable at least within an XY plane, an interferometer system that measures positional information of the stage device within the XY plane, a first mark detection system that can detect subject marks including alignment marks on the other wafer held by the stage device, and a second mark detection system fixed to a part (the second table) of the stage device that can detect subject marks including alignment marks on the one wafer held by the first table.
Public/Granted literature
- US20100139836A1 Substrate Bonding Apparatus and Substrate Bonding Method Public/Granted day:2010-06-10
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