Invention Grant
- Patent Title: Dual hexagonal shaped plasma source
- Patent Title (中): 双六角形等离子体源
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Application No.: US11486471Application Date: 2006-07-14
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Publication No.: US08454810B2Publication Date: 2013-06-04
- Inventor: Makoto Nagashima
- Applicant: Makoto Nagashima
- Applicant Address: AU Perth
- Assignee: 4D-S Pty Ltd.
- Current Assignee: 4D-S Pty Ltd.
- Current Assignee Address: AU Perth
- Agency: Sawyer Law Group, P.C.
- Main IPC: C23C14/35
- IPC: C23C14/35
Abstract:
A plasma source includes a hexagonal hollow cathode, the cathode including six targets and six magnets to generate and maintain a high density plasma; and an anode located beneath the cathode. A second hexagonal hollow cathode can be positioned concentric to the hexagonal hollow cathode.
Public/Granted literature
- US20080011600A1 Dual hexagonal shaped plasma source Public/Granted day:2008-01-17
Information query
IPC分类:
