Invention Grant
- Patent Title: Method of manufacturing plasmon generator
- Patent Title (中): 等离子体发生器的制造方法
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Application No.: US13235856Application Date: 2011-09-19
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Publication No.: US08454848B2Publication Date: 2013-06-04
- Inventor: Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Hironori Araki , Kazuki Sato , Kazumasa Yasuda
- Applicant: Yoshitaka Sasaki , Hiroyuki Ito , Shigeki Tanemura , Hironori Araki , Kazuki Sato , Kazumasa Yasuda
- Applicant Address: US CA Milpitas
- Assignee: Headway Technologies, Inc.
- Current Assignee: Headway Technologies, Inc.
- Current Assignee Address: US CA Milpitas
- Agency: Oliff & Berridge, PLC
- Main IPC: B29D11/00
- IPC: B29D11/00

Abstract:
A method of manufacturing the plasmon generator includes the steps of: forming a base part made of a dielectric material; forming a metal film that is to later become the plasmon generator; and forming a filler layer made of a dielectric material. The base part includes a base surface and a protruding part that protrudes from the base surface. The protruding part has a top surface that is different in level from the base surface, and a first sidewall connecting the top surface of the protruding part to the base surface. The metal film includes an adhesion part adhering to the first sidewall. The filler layer has a second sidewall disposed such that the adhesion part is interposed between the first sidewall and the second sidewall.
Public/Granted literature
- US20130068722A1 METHOD OF MANUFACTURING PLASMON GENERATOR Public/Granted day:2013-03-21
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