Invention Grant
- Patent Title: Gas reforming device
- Patent Title (中): 气体重整装置
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Application No.: US13021968Application Date: 2011-02-07
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Publication No.: US08454899B2Publication Date: 2013-06-04
- Inventor: Naohiro Shimizu , Yuuichirou Imanishi , Sozaburo Hotta
- Applicant: Naohiro Shimizu , Yuuichirou Imanishi , Sozaburo Hotta
- Applicant Address: JP Nagoya
- Assignee: NGK Insulators, Ltd.
- Current Assignee: NGK Insulators, Ltd.
- Current Assignee Address: JP Nagoya
- Agency: Burr & Brown
- Priority: JP2008-207397 20080811
- Main IPC: B01J19/08
- IPC: B01J19/08

Abstract:
A gas reforming device including: a flow passage forming body flow passage through which process gas flows; a cathode provided on a cross section of the flow passage; an anode provided apart from the cathode, and including a bar-like portion; and a pulse power supply that applies a pulse voltage between the cathode and the anode. The cathode includes: an opening array body that has at least a surface thereof made of an insulator, and has a planar structure in which openings through which the process gas passes are arrayed; and a grounding electrode provided on a peripheral portion of the flow passage. A tip end of the bar-like portion of the anode is located in an inside of the flow passage of the process gas, and is spaced apart from the opening array body in a direction parallel to a direction where the process gas flows.
Public/Granted literature
- US20110135542A1 GAS REFORMING DEVICE Public/Granted day:2011-06-09
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