Invention Grant
US08455039B2 Photoresist-coating apparatus and photoresist-coating method using the same
有权
光刻胶涂布装置及使用其的光刻胶涂布方法
- Patent Title: Photoresist-coating apparatus and photoresist-coating method using the same
- Patent Title (中): 光刻胶涂布装置及使用其的光刻胶涂布方法
-
Application No.: US13343377Application Date: 2012-01-04
-
Publication No.: US08455039B2Publication Date: 2013-06-04
- Inventor: Jae-Yeol Park
- Applicant: Jae-Yeol Park
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge, LLP
- Priority: KR10-2008-0040384 20080430
- Main IPC: C23C16/52
- IPC: C23C16/52
Abstract:
A photoresist-coating apparatus includes a substrate on which a particle-detecting area and an invalid particle-detecting area are defined, a nozzle discharging photoresist to the substrate and moving along a direction, and a particle-detecting sensor controlling on and off of the nozzle in the particle-detecting area according to presence of particles, wherein in the invalid particle-detecting area, the nozzle operates independently from detection of the particle-detecting sensor.
Public/Granted literature
- US20120100280A1 PHOTORESIST-COATING APPARATUS AND PHOTORESIST-COATING METHOD USING THE SAME Public/Granted day:2012-04-26
Information query
IPC分类:
