Invention Grant
US08455173B2 Photosensitive insulating resin composition, cured product of the composition, and method of producing insulating film
有权
感光性绝缘树脂组合物，组合物的固化物，以及绝缘膜的制造方法
- Patent Title: Photosensitive insulating resin composition, cured product of the composition, and method of producing insulating film
- Patent Title (中): 感光性绝缘树脂组合物，组合物的固化物，以及绝缘膜的制造方法
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Application No.: US12696021Application Date: 2010-01-28
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Publication No.: US08455173B2Publication Date: 2013-06-04
- Inventor: Hirofumi Sasaki , Atsushi Itou
- Applicant: Hirofumi Sasaki , Atsushi Itou
- Applicant Address: JP Tokyo
- Assignee: JSR Corporation
- Current Assignee: JSR Corporation
- Current Assignee Address: JP Tokyo
- Agency: Ditthavong Mori & Steiner, P.C.
- Priority: JP2009-020665 20090130; JP2009-279870 20091209
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/20 ; G03F7/004 ; G03F7/023 ; G03F7/38 ; G03F7/40 ; C08K5/1525 ; C08K5/17
Abstract:
A photosensitive insulating resin composition includes (A) an alkali-soluble resin that contains (a1) a structural unit derived from a crosslinkable monomer and (a2) a structural unit having a phenolic hydroxyl group, (B) a crosslinking agent, (C) a photosensitive compound, and (D) a solvent.
Public/Granted literature
Information query
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