Invention Grant
- Patent Title: Coating compositions for photolithography
- Patent Title (中): 光刻用涂料组合物
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Application No.: US11904028Application Date: 2007-09-25
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Publication No.: US08455178B2Publication Date: 2013-06-04
- Inventor: Anthony Zampini , Michael K. Gallagher , Vipul Jain , Owendi Ongayi
- Applicant: Anthony Zampini , Michael K. Gallagher , Vipul Jain , Owendi Ongayi
- Applicant Address: US MA Marlborough
- Assignee: Rohm and Haas Electronic Materials LLP
- Current Assignee: Rohm and Haas Electronic Materials LLP
- Current Assignee Address: US MA Marlborough
- Agency: Edwards Wildman Palmer LLP
- Agent Peter F. Corless; Darryl P. Frickey
- Main IPC: G03F7/00
- IPC: G03F7/00 ; G03F7/26
Abstract:
Underlying coating compositions are provided that comprise one or more resins comprising one or more modified imide groups. These coating compositions are particularly useful as antireflective layers for an overcoated photoresist layer. Preferred systems can be thermally treated to increase hydrophilicity of the composition coating layer to inhibit undesired intermixing with an overcoated organic composition layer, while rendering the composition coating layer removable with aqueous alkaline photoresist developer.
Public/Granted literature
- US20080073754A1 Coating compositions for photolithography Public/Granted day:2008-03-27
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