Invention Grant
- Patent Title: Method for manufacturing a patterned retarder
- Patent Title (中): 图案化延迟器的制造方法
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Application No.: US13304003Application Date: 2011-11-23
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Publication No.: US08455181B2Publication Date: 2013-06-04
- Inventor: Hyunjong Noh , Jinho Kim , Youngnam Lim , Kyeongjin Kim
- Applicant: Hyunjong Noh , Jinho Kim , Youngnam Lim , Kyeongjin Kim
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Brinks Hofer Gilson & Lione
- Priority: KR10-2010-0117330 20101124
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
The present disclosure relates to a method for manufacturing the patterned retarder used in the three-dimensional display device. The present disclosure suggests a method for manufacturing a patterned retarder comprising: defining a first retarder region and a second retarder region in the patterned retarder; forming a first polarization pattern at the first retarder region by a partial exposure process having a first exposure energy; and forming a second polarization pattern at the second retarder region by whole exposure process having a second exposure energy. By manufacturing the patterned retarder with lower exposure energy, it is possible to reduce the whole manufacturing takt time, so that the production yield can be enhanced and the production cost can be reduced.
Public/Granted literature
- US20120129107A1 METHOD FOR MANUFACTURING A PATTERNED RETARDER Public/Granted day:2012-05-24
Information query
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