Invention Grant
US08455181B2 Method for manufacturing a patterned retarder 有权
图案化延迟器的制造方法

Method for manufacturing a patterned retarder
Abstract:
The present disclosure relates to a method for manufacturing the patterned retarder used in the three-dimensional display device. The present disclosure suggests a method for manufacturing a patterned retarder comprising: defining a first retarder region and a second retarder region in the patterned retarder; forming a first polarization pattern at the first retarder region by a partial exposure process having a first exposure energy; and forming a second polarization pattern at the second retarder region by whole exposure process having a second exposure energy. By manufacturing the patterned retarder with lower exposure energy, it is possible to reduce the whole manufacturing takt time, so that the production yield can be enhanced and the production cost can be reduced.
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