Invention Grant
US08455255B2 Method for production of novel nano silica particle and use of the nano silica particle 有权
新型纳米二氧化硅颗粒的生产方法和纳米二氧化硅颗粒的使用

  • Patent Title: Method for production of novel nano silica particle and use of the nano silica particle
  • Patent Title (中): 新型纳米二氧化硅颗粒的生产方法和纳米二氧化硅颗粒的使用
  • Application No.: US12303870
    Application Date: 2007-06-07
  • Publication No.: US08455255B2
    Publication Date: 2013-06-04
  • Inventor: Michihiro Nakamura
  • Applicant: Michihiro Nakamura
  • Applicant Address: JP Tokushima-shi, Tokushima
  • Assignee: The University of Tokushima
  • Current Assignee: The University of Tokushima
  • Current Assignee Address: JP Tokushima-shi, Tokushima
  • Agency: Seed IP Law Group PLLC
  • Priority: JP2006-160107 20060608
  • International Application: PCT/JP2007/061587 WO 20070607
  • International Announcement: WO2007/142316 WO 20071213
  • Main IPC: G01N33/552
  • IPC: G01N33/552
Method for production of novel nano silica particle and use of the nano silica particle
Abstract:
The present invention presents a silica particle containing at least one silica compound selected from a group consisting of mercapto-propyl-trimethoxysilane (MPS), mercapto-propyl-triethoxysilane (MPES), mercapto-propyl-methyldimethoxysilane (MPDMS), trimethoxy[2-(7-oxabicyclo[4.1.0]-hepto-3-yl)ethyl]silane (EpoPS), thiocyanatopropyltriethoxysilane (TCPS), and acryloxypropyltrimethoxysilane (AcPS), which can be provided and utilized as a label, a marker, or the like for qualitative test and quantitative test for such as prophylactic agent, therapeutic agent, diagnostic agent, diagnostic and therapeutic agent or the like in dental, medical and veterinary fields regardless of fields.
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