Invention Grant
US08455286B2 Method of making a micro-electro-mechanical-systems (MEMS) device
有权
制造微电子机械系统（MEMS）装置的方法
- Patent Title: Method of making a micro-electro-mechanical-systems (MEMS) device
- Patent Title (中): 制造微电子机械系统（MEMS）装置的方法
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Application No.: US12916395Application Date: 2010-10-29
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Publication No.: US08455286B2Publication Date: 2013-06-04
- Inventor: Lisa H. Karlin , David W. Kierst , Lianjun Liu , Wei Liu , Ruben B. Montez , Robert F. Steimle
- Applicant: Lisa H. Karlin , David W. Kierst , Lianjun Liu , Wei Liu , Ruben B. Montez , Robert F. Steimle
- Applicant Address: US TX Austin
- Assignee: Freescale Semiconductor, Inc.
- Current Assignee: Freescale Semiconductor, Inc.
- Current Assignee Address: US TX Austin
- Agent James L. Clingan, Jr.
- Main IPC: H01L21/00
- IPC: H01L21/00
Abstract:
A method of forming a MEMS device includes forming a sacrificial layer over a substrate. The method further includes forming a metal layer over the sacrificial layer and forming a protection layer overlying the metal layer. The method further includes etching the protection layer and the metal layer to form a structure having a remaining portion of the protection layer formed over a remaining portion of the metal layer. The method further includes etching the sacrificial layer to form a movable portion of the MEMS device, wherein the remaining portion of the protection layer protects the remaining portion of the metal layer during the etching of the sacrificial layer to form the movable portion of the MEMS device.
Public/Granted literature
- US20120107993A1 METHOD OF MAKING A MICRO-ELECTRO-MECHANICAL-SYSTEMS (MEMS) DEVICE Public/Granted day:2012-05-03
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