Invention Grant
- Patent Title: Method to fabricate high performance carbon nanotube transistor integrated circuits by three-dimensional integration technology
- Patent Title (中): 通过三维集成技术制造高性能碳纳米管晶体管集成电路的方法
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Application No.: US12831656Application Date: 2010-07-07
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Publication No.: US08455297B1Publication Date: 2013-06-04
- Inventor: Phaedon Avouris , Kuan-Neng Chen , Yu-Ming Lin
- Applicant: Phaedon Avouris , Kuan-Neng Chen , Yu-Ming Lin
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Michael J. Chang, LLC
- Agent Vazken Alexanian
- Main IPC: H01L51/40
- IPC: H01L51/40

Abstract:
Techniques for fabricating carbon nanotube-based devices are provided. In one aspect, a method for fabricating a carbon nanotube-based integrated circuit is provided. The method comprises the following steps. A first wafer comprising carbon nanotubes is provided. A second wafer comprising one or more device elements is provided. One or more of the carbon nanotubes are connected with one or more of the device elements by bonding the first wafer and the second wafer together. A carbon nanotube-based integrated circuit is also provided.
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