Invention Grant
US08455364B2 Sidewall image transfer using the lithographic stack as the mandrel
失效
使用光刻叠层作为心轴的侧壁图像传输
- Patent Title: Sidewall image transfer using the lithographic stack as the mandrel
- Patent Title (中): 使用光刻叠层作为心轴的侧壁图像传输
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Application No.: US12613682Application Date: 2009-11-06
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Publication No.: US08455364B2Publication Date: 2013-06-04
- Inventor: Sivananda K. Kanakasabapathy
- Applicant: Sivananda K. Kanakasabapathy
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Harrington & Smith
- Agent Louis J. Percello
- Main IPC: H01L21/302
- IPC: H01L21/302

Abstract:
In one non-limiting exemplary embodiment, a method includes: providing a structure having at least one lithographic layer on a substrate, where the at least one lithographic layer includes a planarization layer (PL); forming a sacrificial mandrel by patterning at least a portion of the at least one lithographic layer using a photolithographic process, where the sacrificial mandrel includes at least a portion of the PL; and producing at least one microstructure by using the sacrificial mandrel in a sidewall image transfer process.
Public/Granted literature
- US20110111596A1 Sidewall Image Transfer Using the Lithographic Stack as the Mandrel Public/Granted day:2011-05-12
Information query
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