Invention Grant
US08455604B1 Polysilane compositions, methods for their synthesis and films formed therefrom
有权
聚硅烷组合物,其合成方法和由其形成的薄膜
- Patent Title: Polysilane compositions, methods for their synthesis and films formed therefrom
- Patent Title (中): 聚硅烷组合物,其合成方法和由其形成的薄膜
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Application No.: US13543557Application Date: 2012-07-06
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Publication No.: US08455604B1Publication Date: 2013-06-04
- Inventor: Wenzhuo Guo , Vladimir K. Dioumaev , Joerg Rockenberger , Brent Ridley
- Applicant: Wenzhuo Guo , Vladimir K. Dioumaev , Joerg Rockenberger , Brent Ridley
- Applicant Address: US CA San Jose
- Assignee: Kovio, Inc.
- Current Assignee: Kovio, Inc.
- Current Assignee Address: US CA San Jose
- Agent Andrew Fortney
- Main IPC: C08G77/00
- IPC: C08G77/00 ; C07F7/02 ; C07F7/21

Abstract:
Polysilanes, inks containing the same, and methods for their preparation are disclosed. The polysilane may have the formula H-[(AHR)n(c-AmHpm-2)q]—H, where A is independently Si or Ge; R is H, -AaHa+1Ra, halogen, aryl or substituted aryl; (n+a)≧10 if q=0, q≧3 if n=0, and (n+q)≧6 if both n and q≠0; p is 1 or 2; and m is from 3 to 12. The method may include combining a silane compound of the formula AHaR14-a, AkHgR1′h and/or c-AmHpmR1rm with a catalyst of the formula R4xR5yMXz (or an immobilized derivative thereof) to form a poly(aryl)silane; then washing the poly(aryl)silane with an aqueous washing composition and contacting the poly(aryl)silane with an adsorbent to remove the metal M. Alternatively, the method may include halogenating a polyarylsilane and reducing the halopolysilane with a metal hydride to form the polysilane.
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