Invention Grant
US08455770B2 Method of fabricating wiring board and method of fabricating semiconductor device 有权
制造布线板的方法和制造半导体器件的方法

Method of fabricating wiring board and method of fabricating semiconductor device
Abstract:
A method of fabricating a wiring board includes forming a resist layer, such as a solder or plating resist layer, defining an opening portion on a support board such that a portion of the support board is exposed. An electrode is formed directly on the support board within the opening portion, and the plating resist layer, when used, is removed. An insulating layer is formed on the electrode, as well as the support board or solder resist layer, and a wiring portion connected to the electrode at the insulating layer is also formed. A solder resist layer having an opening portion is then formed on the wiring portion, and the support board is removed to expose a surface of the electrode or a surface of the electrode and insulating layer. Another solder resist layer having an opening portion may then be formed on the exposed surface of the insulating layer.
Information query
Patent Agency Ranking
0/0