Invention Grant
- Patent Title: Laser processing apparatus, process control apparatus, and processing apparatus
- Patent Title (中): 激光加工装置,过程控制装置和处理装置
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Application No.: US12665574Application Date: 2008-07-04
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Publication No.: US08455787B2Publication Date: 2013-06-04
- Inventor: Hiroko Takada
- Applicant: Hiroko Takada
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2007-176371 20070704
- International Application: PCT/JP2008/062177 WO 20080704
- International Announcement: WO2009/005145 WO 20090108
- Main IPC: B23K26/00
- IPC: B23K26/00

Abstract:
A laser processing apparatus in which a workpiece is placed on a work support base that supports the workpiece at a plurality of support points and performs, while moving a processing head in a horizontal direction with respect to the workpiece, laser processing on the workpiece on the work support base by the processing head, includes a tilt judging unit that judges, based on a positional relationship between a product chip that is to be separated from the workpiece when the workpiece is subjected to laser processing and support points, whether the product chip tilts in a height direction and projects upward on a side of the processing head from the workpiece before laser processing; and a drive control unit that controls a height of the processing head with respect to the workpiece when moving the processing head to a processing position for a next product chip after completing laser processing on the product chip based on a judgment result of the tilt judging unit.
Public/Granted literature
- US20100193479A1 LASER PROCESSING APPARATUS, PROCESS CONTROL APPARATUS, AND PROCESSING APPARATUS Public/Granted day:2010-08-05
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