Invention Grant
- Patent Title: Memory cell having dielectric memory element
- Patent Title (中): 具有介质存储元件的存储单元
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Application No.: US12352402Application Date: 2009-01-12
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Publication No.: US08455855B2Publication Date: 2013-06-04
- Inventor: Jun Liu
- Applicant: Jun Liu
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Schwegman Lundberg & Woessner, P.A.
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L21/20

Abstract:
Some embodiments include apparatus and methods having a memory cell with a first electrode, a second electrode, and a dielectric located between the first and second electrodes. The dielectric may be configured to allow the memory cell to form a conductive path in the dielectric from a portion of a material of the first electrode to represent a first value of information stored in the memory cell. The dielectric may also be configured to allow the memory cell to break the conductive path to represent a second value of information stored in the memory cell.
Public/Granted literature
- US20100176367A1 MEMORY CELL HAVING DIELECTRIC MEMORY ELEMENT Public/Granted day:2010-07-15
Information query
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