Invention Grant
- Patent Title: Semiconductor light emitting device and manufacturing method thereof
- Patent Title (中): 半导体发光器件及其制造方法
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Application No.: US12878197Application Date: 2010-09-09
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Publication No.: US08455912B2Publication Date: 2013-06-04
- Inventor: Satoshi Tanaka , Yusuke Yokobayashi
- Applicant: Satoshi Tanaka , Yusuke Yokobayashi
- Applicant Address: JP Tokyo
- Assignee: Stanley Electric Co., Ltd.
- Current Assignee: Stanley Electric Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Holtz, Holtz, Goodman & Chick, P.C.
- Priority: JP2009-211537 20090914
- Main IPC: H01L33/36
- IPC: H01L33/36 ; H01L33/00

Abstract:
A light-emitting device which includes a first semiconductor layer of a first conductivity type; a second semiconductor layer of a second conductivity type; and a light emitting layer provided between the first and second semiconductor layers, the device comprises a first electrode formed on the first semiconductor layer; a second electrode formed on the second semiconductor layer; and a light-transmissive electrode covering the second semiconductor layer and the second electrode, wherein contact between the second electrode and the second semiconductor layer is non-ohmic, and the second electrode has a stacked structure including a lower layer and an upper layer whose contact resistance with the light-transmissive electrode is lower than that of the lower layer, part of the second electrode being exposed through an opening formed in the light-transmissive electrode.
Public/Granted literature
- US20110062484A1 SEMICONDUCTOR LIGHT EMITTING DEVICE AND MANUFACTURING METHOD THEREOF Public/Granted day:2011-03-17
Information query
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