Invention Grant
US08455926B2 Systems, methods, and apparatus of a low conductance silicon micro-leak for mass spectrometer inlet
有权
用于质谱仪入口的低电导硅微漏泄的系统，方法和装置
- Patent Title: Systems, methods, and apparatus of a low conductance silicon micro-leak for mass spectrometer inlet
- Patent Title (中): 用于质谱仪入口的低电导硅微漏泄的系统，方法和装置
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Application No.: US12889014Application Date: 2010-09-23
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Publication No.: US08455926B2Publication Date: 2013-06-04
- Inventor: Dan N. Harpold , Hasso B. Niemann , Brian G. Jamieson , Bernard A. Lynch
- Applicant: Dan N. Harpold , Hasso B. Niemann , Brian G. Jamieson , Bernard A. Lynch
- Applicant Address: US DC Washington
- Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
- Current Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
- Current Assignee Address: US DC Washington
- Main IPC: H01L27/148
- IPC: H01L27/148
Abstract:
Systems, methods and apparatus are provided through which in some embodiments a mass spectrometer micro-leak includes a number of channels fabricated by semiconductor processing tools and that includes a number of inlet holes that provide access to the channels.
Public/Granted literature
- US20110095181A1 SYSTEMS, METHODS, AND APPARATUS OF A LOW CONDUCTANCE SILICON MICRO-LEAK FOR MASS SPECTROMETER INLET Public/Granted day:2011-04-28
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