Invention Grant
- Patent Title: Semiconductor device and method for manufacturing the same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US12078894Application Date: 2008-04-08
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Publication No.: US08455969B2Publication Date: 2013-06-04
- Inventor: Yoshihiro Nabe , Masaki Hatano , Hiroshi Asami , Akihiro Morimoto
- Applicant: Yoshihiro Nabe , Masaki Hatano , Hiroshi Asami , Akihiro Morimoto
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Rader, Fishman & Grauer PLLC
- Priority: JP2007-130354 20070516
- Main IPC: H01L31/00
- IPC: H01L31/00 ; H01L21/00

Abstract:
A semiconductor device includes a semiconductor substrate having a first electronic circuit and a second electronic circuit formed on an active surface, a pad electrode formed on the active surface by being connected to the first electronic circuit and/or the second electronic circuit, a first opening formed to some point along a depth of the semiconductor substrate toward the pad electrode from a surface opposite to the active surface of the semiconductor substrate, a second opening formed so as to reach the pad electrode from a bottom surface of the first opening, an insulating layer formed by covering sidewall surfaces of the first opening and the second opening, a conductive layer formed by covering at least an inner wall surface of the insulating layer and a bottom surface of the second opening, a third opening formed to some point along the depth of the semiconductor substrate from the surface opposite to the active surface of the semiconductor substrate, and a heat insulator imbedded in the third opening.
Public/Granted literature
- US20080283951A1 Semiconductor device and method for manufacturing the same Public/Granted day:2008-11-20
Information query
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