Invention Grant
US08455978B2 Semiconductor circuit structure and method of making the same 有权
半导体电路结构及制作方法

  • Patent Title: Semiconductor circuit structure and method of making the same
  • Patent Title (中): 半导体电路结构及制作方法
  • Application No.: US12847374
    Application Date: 2010-07-30
  • Publication No.: US08455978B2
    Publication Date: 2013-06-04
  • Inventor: Sang-Yun Lee
  • Applicant: Sang-Yun Lee
  • Agent Greg L. Martinez
  • Main IPC: H01L23/02
  • IPC: H01L23/02 H01L21/31
Semiconductor circuit structure and method of making the same
Abstract:
A semiconductor circuit structure includes an interconnect region, and a material transfer region. The semiconductor circuit structure includes a conductive bonding region which couples the material transfer region to the interconnect region through a bonding interface. The conductive bonding region includes a barrier layer between a conductive layer and bonding layer. The bonding layer is positioned towards the material transfer region, and the conductive layer is positioned towards the interconnect region.
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