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US08455979B2 Three dimensional integrated deep trench decoupling capacitors 失效
三维集成深沟槽去耦电容器

Three dimensional integrated deep trench decoupling capacitors
Abstract:
A method of forming an integrated circuit device includes forming a plurality of deep trench decoupling capacitors on a first substrate; forming a plurality of active circuit devices on a second substrate; bonding the second substrate to the first substrate; and forming electrical connections between the deep trench capacitors and the second substrate.
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