A method of fabricating a liquid crystal display device includes providing a first substrate having a first region and a second region; forming an active pattern in the first and second regions of the first substrate; forming a first insulation film on the first substrate; forming a first gate electrode with a low-resistance conductive material on an upper portion of the active pattern; forming a second gate electrode to completely cover the first gate electrode on an exposed portion of the first gate electrode; forming N type source and drain regions in the active pattern of the first region by doping an n+ impurity ion; forming P type source and drain regions in the active pattern of the second region by doping a p+ impurity ion; forming a second insulation film on the first substrate; forming N type source and drain electrodes electrically connected with the N type source and drain regions on the first region and forming P type source and drain electrodes electrically connected with the P type source and drain regions on the second region; and attaching the first and second substrates. A low-resistance wiring can be implemented on a large-scale liquid crystal display panel by forming a second gate wiring of a clad structure at an upper portion of a low-resistance first gate wiring.