Invention Grant
- Patent Title: Maintenance method, maintenance device, exposure apparatus, and device manufacturing method
- Patent Title (中): 维护方法，维护装置，曝光装置和装置制造方法
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Application No.: US12805715Application Date: 2010-08-16
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Publication No.: US08456608B2Publication Date: 2013-06-04
- Inventor: Tomoharu Fujiwara , Yasufumi Nishii , Kenichi Shiraishi
- Applicant: Tomoharu Fujiwara , Yasufumi Nishii , Kenichi Shiraishi
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2004-353093 20041206
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/32 ; G03B27/68 ; G03B27/42 ; G03B27/58
Abstract:
An exposure apparatus is provided with a nozzle member that has at least one of a supply outlet which supplies the liquid and a collection inlet which recovers the liquid. By immersing the nozzle member in cleaning liquid LK stored in container, the nozzle member is cleaned.
Public/Granted literature
- US20100315609A1 Maintenance method, maintenance device, exposure apparatus, and device manufacturing method Public/Granted day:2010-12-16
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