Invention Grant
- Patent Title: System and method to increase surface tension and contact angle in immersion lithography
- Patent Title (中): 浸没光刻中增加表面张力和接触角的系统和方法
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Application No.: US12834691Application Date: 2010-07-12
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Publication No.: US08456611B2Publication Date: 2013-06-04
- Inventor: Harry Sewell
- Applicant: Harry Sewell
- Applicant Address: NL Veldhoven
- Assignee: ASML Holding N.V.
- Current Assignee: ASML Holding N.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52 ; G03B27/58
Abstract:
A system and method to allow organic fluids to be used in immersion lithographic systems. This is done by providing a showerhead portion of a liquid supply system that is partially coated or made from a TEFLON like material. The TEFLON like material reduces wetness effect, and thus increases containment, when using an organic immersion fluid in a space between the last optic and the substrate.
Public/Granted literature
- US20100271604A1 SYSTEM AND METHOD TO INCREASE SURFACE TENSION AND CONTACT ANGLE IN IMMERSION LITHOGRAPHY Public/Granted day:2010-10-28
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