Invention Grant
US08456617B2 Exposure method, exposure device, and micro device manufacturing method
有权
曝光方法,曝光装置和微型装置制造方法
- Patent Title: Exposure method, exposure device, and micro device manufacturing method
- Patent Title (中): 曝光方法,曝光装置和微型装置制造方法
-
Application No.: US12507275Application Date: 2009-07-22
-
Publication No.: US08456617B2Publication Date: 2013-06-04
- Inventor: Kei Nara
- Applicant: Kei Nara
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Miles & Stockbridge P.C.
- Priority: JP2007-015391 20070125
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/42 ; G03B27/54 ; G03B27/74

Abstract:
An exposure device includes: a light source (LS) which emits a pulse light; and a variable shaped mask (8) which has a plurality of aligned micro movable mirrors and forms an arbitrary pattern by selectively changing the operation state of the movable mirrors. A substrate (P) is exposed to the light emitted from the light source and passes through the variable shaped mask. The exposure device further includes a control device (100) which controls the operation timing to change the operation state of the movable mirrors and the pulse application timing of the pulse light emitted from the light source so that they are synchronized.
Public/Granted literature
- US20090280441A1 EXPOSURE METHOD, EXPOSURE DEVICE, AND MICRO DEVICE MANUFACTURING METHOD Public/Granted day:2009-11-12
Information query