Invention Grant
US08456624B2 Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method 有权
空间光调制器,照明光学系统,调整照明光学系统的方法,曝光装置和装置制造方法的检查装置和检查方法

  • Patent Title: Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
  • Patent Title (中): 空间光调制器,照明光学系统,调整照明光学系统的方法,曝光装置和装置制造方法的检查装置和检查方法
  • Application No.: US12952197
    Application Date: 2010-11-22
  • Publication No.: US08456624B2
    Publication Date: 2013-06-04
  • Inventor: Osamu TanitsuHirohisa Tanaka
  • Applicant: Osamu TanitsuHirohisa Tanaka
  • Applicant Address: JP Tokyo
  • Assignee: Nikon Corporation
  • Current Assignee: Nikon Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Oliff & Berridge, PLC
  • Priority: JP2008-138841 20080528
  • Main IPC: G01N21/00
  • IPC: G01N21/00
Inspection device and inspecting method for spatial light modulator, illumination optical system, method for adjusting the illumination optical system, exposure apparatus, and device manufacturing method
Abstract:
There is disclosed an inspection device for inspecting a spatial light modulator having a plurality of optical elements arrayed two-dimensionally and controlled individually, said inspection device comprising, a conjugate optical system which is arranged optically downstream the spatial light modulator and which forms a conjugate plane optically conjugate with an array plane where the plurality of optical elements are arrayed, a photodetector having a detection surface arranged on or near the conjugate plane, and an inspection unit which inspects optical characteristics of the plurality of optical elements, based on a result of detection by the photodetector.
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