Invention Grant
- Patent Title: Semiconductor ESD device and method
- Patent Title (中): 半导体ESD器件及方法
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Application No.: US12911582Application Date: 2010-10-25
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Publication No.: US08456785B2Publication Date: 2013-06-04
- Inventor: Krzysztof Domanski , Cornelius Christian Russ , David Alvarez , Wolfgang Soldner
- Applicant: Krzysztof Domanski , Cornelius Christian Russ , David Alvarez , Wolfgang Soldner
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H02H9/00
- IPC: H02H9/00 ; H02H1/00 ; H02H1/04 ; H02H3/22 ; H02H9/06

Abstract:
An embodiment semiconductor device has a first device region disposed on a second device region within an ESD device region disposed within a semiconductor body. Also included is a third device region disposed on the second device region, a fourth device region adjacent to the second device region, a fifth device region disposed within the fourth device region, and a sixth device region adjacent to the fourth device region. The first and fourth regions have a first semiconductor type, and the second, third, fifth and sixth regions have a second conductivity type opposite the first conductivity type. An interface between the fourth device region and the sixth device region forms a diode junction. The first, second, fourth and fifth device regions form a silicon controlled rectifier.
Public/Granted literature
- US20120099229A1 Semiconductor ESD Device and Method Public/Granted day:2012-04-26
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