Invention Grant
- Patent Title: Nonvolatile memory device and method for fabricating the same
- Patent Title (中): 非易失性存储器件及其制造方法
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Application No.: US13308972Application Date: 2011-12-01
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Publication No.: US08456909B2Publication Date: 2013-06-04
- Inventor: Ki-Hong Lee , Kwon Hong , Min-Soo Kim
- Applicant: Ki-Hong Lee , Kwon Hong , Min-Soo Kim
- Applicant Address: KR Gyeonggi-do
- Assignee: Hynix Semiconductor Inc.
- Current Assignee: Hynix Semiconductor Inc.
- Current Assignee Address: KR Gyeonggi-do
- Agency: IP & T Group LLP
- Priority: KR10-2010-0140510 20101231
- Main IPC: G11C16/04
- IPC: G11C16/04

Abstract:
Provided are a nonvolatile memory device and a method for fabricating the same, which can secure the structural stability of a three-dimensional nonvolatile memory device. The nonvolatile memory device includes one or more columnar channel plugs, a plurality of word lines and a plurality of dielectric layers stacked alternately to surround the columnar channel plug, a memory layer disposed between the word line and the columnar channel plug, a plurality of word line connection portions, each of the word line connection portions connecting ends of word lines of a common layer from among the plurality of word lines, and a plurality of word line extension portions extending from the word line connection portions.
Public/Granted literature
- US20120170368A1 NONVOLATILE MEMORY DEVICE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2012-07-05
Information query