Invention Grant
US08457385B2 Measurement system and lithographic apparatus for measuring a position dependent signal of a movable object
有权
用于测量可移动物体的位置相关信号的测量系统和光刻设备
- Patent Title: Measurement system and lithographic apparatus for measuring a position dependent signal of a movable object
- Patent Title (中): 用于测量可移动物体的位置相关信号的测量系统和光刻设备
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Application No.: US13019587Application Date: 2011-02-02
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Publication No.: US08457385B2Publication Date: 2013-06-04
- Inventor: Marc Wilhelmus Maria Van Der Wijst , Engelbertus Antonius Fransiscus Van Der Pasch , Koen Jacobus Johannes Maria Zaal
- Applicant: Marc Wilhelmus Maria Van Der Wijst , Engelbertus Antonius Fransiscus Van Der Pasch , Koen Jacobus Johannes Maria Zaal
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
An encoder-type measurement system is configured to measure a position dependent signal of a movable object, the measurement system including at least one sensor mountable on the movable object a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame. The measurement system further includes a compensation device configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensation device may include a passive or an active damping device and/or a feedback position control system. In an alternative embodiment, the compensation device includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.
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