Invention Grant
- Patent Title: Method and an apparatus for growing a silicon single crystal from a melt
- Patent Title (中): 从熔体生长硅单晶的方法和装置
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Application No.: US12765896Application Date: 2010-04-23
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Publication No.: US08460462B2Publication Date: 2013-06-11
- Inventor: Piotr Filar
- Applicant: Piotr Filar
- Applicant Address: DE Munich
- Assignee: Siltronic AG
- Current Assignee: Siltronic AG
- Current Assignee Address: DE Munich
- Agency: Brooks Kushman P.C.
- Priority: EP09006477 20090513
- Main IPC: C30B15/00
- IPC: C30B15/00 ; C30B21/06 ; C30B27/02 ; C30B28/10 ; C30B30/04 ; C30B13/28

Abstract:
Silicon single crystals are grown from the melt by providing the melt in a crucible; imposing a horizontal magnetic field on the melt; directing a gas between the single crystal and a heat shield to a melt free surface, and controlling the gas to flow over a region of the melt free surface extending in a direction substantially perpendicular to the magnetic induction. A suitable apparatus has a crucible for holding the melt; a heat shield surrounding the silicon single crystal having a lower end which is connected to a bottom cover facing a melt free surface and a non-axisymmetric shape with respect to a crucible axis, such that gas which is directed between the crystal and the heat shield to the melt free surface is forced to flow over a region of the melt which extends substantially perpendicular to the magnetic induction.
Public/Granted literature
- US20100288185A1 Method And An Apparatus For Growing A Silicon Single Crystal From A Melt Public/Granted day:2010-11-18
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